Aug. 17 at 11:00 AM
$TT $ETN
Trane and Eaton announce strategic collaboration
Trane Technologies (TT) and Eaton (ETN) announced a strategic collaboration integrating advanced thermal management and electrical system architectures to help accelerate AI-factory deployment, enhance efficiency and lower costs. Trane Technologies and Eaton are introducing a first-of-its kind reference design that replaces a traditionally slow, manual and siloed design process with a unified, intelligent system for power and cooling for next-generation data centers.
By advancing medium-voltage designs for higher-power density AI factories, the companies can achieve combined energy efficiency gains of up to 15%, cut copper use by as much as 80% and reduce installation costs by up to 30% compared to conventional, low-voltage designs, while enabling faster deployment and reducing complexity. The new reference design is included in both the Trane Continuum Rubin DSX and Eaton Beam Rubin DSX platforms, built in alignment with the NVIDIA DSX platforms, with Eaton's technology helping provide power distribution for the Trane platform.
